Botlagunta Preethish Nanan is a distinguished expert in AI-driven computational lithography, semiconductor manufacturing, and advanced analytics, specializing in deep learning, predictive modeling, and metrology optimization. His pioneering research focuses on leveraging Agentic AI, neural networks, and generative AI to enhance semiconductor yield, optimize mask patterning, and drive innovation in High-NA EUV lithography and metrology solutions. With a strong foundation in data analytics, business intelligence, and machine learning, he has made significant contributions to defect detection, resolution enhancement, and predictive maintenance in next-generation semiconductor fabrication. A passionate author and researcher, he is dedicated to advancing AI-powered lithography strategies, extending Moore’s Law, and pushing the boundaries of chip miniaturization and performance efficiency.